Characterization of nitrided SiO 2 thin films using secondary ion mass spectrometry

Applied Surface Science

Volumn 104-105, Issue , 1996, Pages 379-384

  Frost, M R ^a   Magee, C W ^a  

^a Evans East   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; MEASUREMENT ERRORS; NITRIDING; NITROGEN; SECONDARY ION MASS SPECTROMETRY; SENSITIVITY ANALYSIS; THIN FILMS;

SPATIAL DISTRIBUTION;

SILICA;

EID: 0344729397     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00175-4     Document Type: Article

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