Applications of the cavity ring-down technique to a large-area rf-plasma reactor

Plasma Sources Science and Technology

Volumn 8, Issue 3, 1999, Pages 448-456

  Grangeon, F ^a   Monard, C ^a   Dorier, J L ^a   Howling, A A ^a   Hollenstein, Ch ^a   Romanini, D ^b   Sadeghi, N ^b  

^a EPFL   (Switzerland)

^b LIPHY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; HYDROGEN; LASER PULSES; LIGHT ABSORPTION; MIRRORS; NEGATIVE IONS; OXYGEN; PLASMA DIAGNOSTICS; SILANES;

CAVITY RING DOWN TECHNIQUE; NEGATIVE ION DENSITY; PLASMA REACTOR;

PLASMA DENSITY;

EID: 0032669255     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/8/3/315     Document Type: Article

References (32)

1. O'Keefe A and Deacon D 1988 Rev. Sci. Instrum. 59 2544
2. Romanini D 1998 Cavity ring down and intracavity laser absorption Cavity-RingDown Spectroscopy - a New Technique for Trace Absorption Measurements ed K W Busch and M A Busch (Washington: American Chemical Society) to be published
3. O'Keefe A, Sherer J J, Cooksy A L, Sheeks R, Heath J and SayKally R J 1990 Chem. Phys. Lett. 172 214
4. Yu T and Lin M C 1993 J. Am. Chem. Soc. 115 4371
5. Meijer G, Boogaarts M G H, Jongma R T, Parker D H and Wodtke A M 1994 Chem. Phys. Lett. 217 112
6. Zalicki P, Ma Y, Zare R N, Wahl E H, Dadamio J, Owano T G and Kruger C H 1995 Chem. Phys. Lett. 234 269
7. Kotterer M, Couccicao J and Maier J P 1996 Chem. Phys. Lett. 259 233
8. Romanini D and Lehmann K K 1993 J. Chem. Phys. 99 6287
9. Romanini D, Kachanov A A, Sadeghi N and Stoeckel F 1997 Chem. Phys. Lett. 264 316
10. Campargue A, Romanini D and Sadeghi N 1998 J. Phys. D: Appl. Phys. 31 1168
11. Quandt E, Döbele H F and Graham W G 1998 Appl. Phys. Lett. 72 2394
12. Sansonnens L, Pletzer A, Magni D, Howling A A, Hollenstein Ch and Schmitt JPM 1997 Plasma Sources Sci. Technol. 6 170
13. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley-Interscience)
14. Vender D, Stoffels W W, Stoffels E, Kroesen G M W and de Hoog F J 1995 Phys. Rev. E 51 2436
15. Yasuda N, Amemiya H and Endo M 1994 Proc. 2nd Int. Conf. on Reactive Plasmas and 11th Symp. on Plasma Processing (Yokohama, Japan, 1994) p 613
16. Suzuki T and Kasuya T 1987 Phys. Rev. A 36 2129
17. Shibata M, Nakano N and Makabe T 1997 J. Phys. D: Appl. Phys. 30 1219
18. Shibata M, Nakano N and Makabe T 1995 J. Appl. Phys. 77 6181
19. Stoffels E, Stoffels W W, Vender D, Kando M, Kroesen G M W and de Hoog F J 1995 Phys. Rev. E 51 2425
20. Boeuf J P and Pitchford L C 1995 Phys. Rev. E 51 1376 Kinema Research Associates SIGLO-RF (Simulation of Glow Discharges RF-excited, capacitively-coupled) modeling software
21. Fink J H 1984 Fusion Technol. 6 548
22. Fukuzawa T, Obata K, Kawasaki H, Shiratani M and Watanabe Y 1996 J. Appl. Phys. 80 3202
23. Müller H et al Private communication
24. Spears K G, Robinson T J and Roth R M 1986 IEEE Trans. Plasma Sci. 14 179
25. Howling A A, Courteille C, Dorier J-L, Sansonnens L and Hollenstein Ch 1996 Pure Appl. Chem. 68 1017
26. Dorier J-L, Hollenstein Ch and Howling A A 1992 J. Vac. Sci. Technol. A 10 1048
27. Boufendi L, Hermann J, Bouchoule A, Dubreuil B, Stoffels E, Stoffels W W and de Giorgi M L 1994 J. Appl. Phys. 76 148
28. Stoffels W W, Stoffels E, Kroesen G M W and de Hoog F J 1995 J. Appl. Phys. 78 4867
29. Courteille C, Hollenstein Ch, Dorier J-L, Gay P, Schwarzenbach W, Howling A A, Bertran E, Viera G, Martins R and Macarico A 1996 J. Appl. Phys. 80 2069
30. 1989 Properties of Amorphous Silicon (London: INSPEC) p 328
31. Dorier J-L, Hollenstein Ch and Howling A A 1995 J. Vac. Sci. Technol. A 13 918
32. Kruger C H, Owano T G, Laux C O and Zare R N 1997 J. Physique IV 7 67