A low temperature collimated titanium deposition process

Journal of the Electrochemical Society

Volumn 144, Issue 5, 1997, Pages 1849-1854

  Hegde, Rama I ^a   Fiordalice, Robert W ^a   Kolar, Dave ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; METALLIC FILMS; SURFACE STRUCTURE;

SURFACE TOPOGRAPHY; TITANIUM FILMS;

TITANIUM;

EID: 0031140424     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837689     Document Type: Article

References (10)

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