Refractive indices and thicknesses of optical waveguides fabricated by silicon ion implantation into silica glass

Thin Solid Films

Volumn 340, Issue 1, 1999, Pages 233-236

  Gazecki, J ^a   Kubica, J M ^b   Zamora, M ^a   Reeves, G K ^a   Johnson, C M ^c   Ridgway, M C ^c  

^a RMIT UNIVERSITY   (Australia)

^b WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

^c AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; GLASS; ION IMPLANTATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILICA;

DARK MODE SPECTROSCOPY METHOD; SILICON OXIDE;

OPTICAL WAVEGUIDES;

EID: 0032650146     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01333-9     Document Type: Article

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