Channel waveguides formed by ion implantation of PECVD grown silica

IEE Proceedings: Optoelectronics

Volumn 144, Issue 2, 1997, Pages 97-100

  Leech, P W ^a   Faith, M F ^b   Johnson, C M ^c   Ridgway, M C ^c   Bazylenko, M ^d  

^a CSIRO   (Australia)

^b TELSTRA RESEARCH LABORATORIES   (Australia)

^c AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^d UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

Ion implantation; Low loss waveguides; Optical loss characteristics; Plasma enhanced chemical vapour deposition

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; COMPOSITION; ELECTROMAGNETIC WAVE ATTENUATION; ION IMPLANTATION; PLASMA APPLICATIONS; RELAXATION PROCESSES; SEMICONDUCTING SILICON; SILICA; SUBSTRATES; THERMAL EFFECTS;

LOW LOSS CHANNEL WAVEGUIDES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

OPTICAL WAVEGUIDES;

EID: 0031121688     PISSN: 13502433     EISSN: None     Source Type: Journal    
DOI: 10.1049/ip-opt:19970782     Document Type: Article

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