Channel waveguides formed by ion implantation of 20 mol% Ge-doped silica

Electronics Letters

Volumn 32, Issue 11, 1996, Pages 1000-1002

  Leech, P W ^a   Faith, M ^a   Ridgway, M C ^b   Leistiko, O ^c  

^a TELSTRA RESEARCH LABORATORIES   (Australia)

^b AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^c TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

Author keywords

Integrated optics; Ion implantation; Optical waveguides

Indexed keywords

GERMANOSILICATE FILM; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION; SINGLEMODE CHANNEL WAVEGUIDES;

CHEMICAL VAPOR DEPOSITION; DIFFRACTION GRATINGS; FUSED SILICA; INTEGRATED OPTICS; ION IMPLANTATION; PLASMA APPLICATIONS; SEMICONDUCTING FILMS; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; SUBSTRATES;

OPTICAL WAVEGUIDES;

EID: 0030149329     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19960684     Document Type: Article

References (9)

1. VERHAEGEN, M., ALLARD, L.B., BREBNER, J.L., ESSID, M., ROORDA, S., and ALBERT, J.: 'Photorefractive waveguides produced by ion implantation of fused silica', Nucl. Instrum. Methods Phys. Res., 1995, pp. 438-441
2. TOWNSEND, P.D., CHANDLER, P.J., and ZHANG, L.: 'Optical effects of ion implantation', (Cambridge University Press, Cambridge, 1994) p. 52
3. LEECH, P.W., KEMENY, P.C., and RIDGWAY, M.: 'Low loss channel waveguides fabricated in fused silica by germanium ion implantation', Electron. Lett., 1995, 31, (15) pp. 1238-1240
4. LEECH, P.W., RIDGWAY, M., and FAITH, M.: 'Channel waveguides formed in fused silica and silica-on-silicon by Si, P and Ge ion implantation', IEE Proc. Optoelectron., 1996,
5. ALBERT, J., MALO, B., HILL, K.O., JOHNSON, D.C., BREBNER, J.L., and LEONELLI, R.: 'Refractive-index changes in fused silica produced by heavy-ion implantation followed by photobleaching', Opt. Lett., 1992, 17, (23), pp. 1652-1654
6. WILLIAMS, D.L., AINSLIE, B.J., KASHYAP, R., MAXWELL, G.D., ARMITAGE, J.R., CAMPBELL, R.J., and WYATT, R.: 'Photosenstive index changes in germania doped silica glass fibres and waveguides'. Proc. SPIE, 1993, 2044, pp. 55-68
7. MOSS, D., OUELLETTE, F., FAITH, M., LEECH, P., KEMENY, P., IBSEN, M., LIESTIKO, O., POULSEN, C.V., LOVE, J.D., and LADOUCER, F.J.: 'All optically written plansar germanosilicate waveguide gratings', Electron. Lett., 1996, 32,
8. SVALGAARD, M., POULSEN, C.V., BJARKLEV, A., and POULSEN, O.: 'Direct UV writing of buried singlemode channel waveguides in Ge-doped silica films', Electron. Lett., 1994, 30, (17), pp. 1401-1403
9. BAZYLENKO, M.V., GROSS, M., SIMONIAN, A., and CHU, P.L.: 'Pure and fluoride-doped silica films deposited in a hollow cayhode reactor for integrated optic applications', J. Vac. Sci. Technol., March 1996, pp. 336-345