Size and shape modification of self assembled InAs quantum dots and stacked layers by in-situ etching

Microelectronics Journal

Volumn 30, Issue 4, 1999, Pages 341-345

  Schuler, H ^a   Eberl, K ^a  

^a MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; MOLECULAR BEAM EPITAXY; NUCLEATION; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR GROWTH;

STACKED LAYERS; STRANSKI-KRASTANOV GROWTH MODES;

SEMICONDUCTOR QUANTUM DOTS;

EID: 0032649364     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2692(98)00132-3     Document Type: Article

References (15)

1. Petroff P.M., Baars S.P.D. Superlatt. Microstruct. 15:1994;15.
2. Bimberg D., Ledentsov N., Grundmann M., Kirchstaedter N., Schmidt O.G., Mao M.H., Ustinov V., Egorov A., Zhukov A., Kopév P., Alferov Z., Ruvimov S.S., Gösele U., Heydenreich J. Jpn. J. Appl. Phys. 35:(1):1996;1311.
3. Kurthenbach A., Eberl K., Shitara T. Appl. Phys. Lett. 66:1995;361.
4. Seifert W., Carlsson N., Castrillo P., Peterson A., Pistol M.E., Samuelson L. Appl. Phys. Lett. 65:1994;3093.
5. Xie O., Madhukar A., Cheng P., Kobayashi N. Phys. Rev. Lett. 75:1995;2542.
6. Solomon G., Trezza J., Marshall A., Harris J. Phys. Rev. Lett. 76:1996;1675.
7. Zundel M., Specht P., Eberl K., Jin-Phillipp N.Y., Phillipp F. Appl. Phys. Lett. 71:1997;2972.
8. O.G. Schmidt, Y. Hao, K. Eberl, O. Kienzle, F. Ernst, Appl. Phys. Lett., submitted.
9. Nakata Y., Sugiyama Y., Futatsugi T., Yokoyama N. J. Cryst. Growth. 175/176:1997;713.
10. Kaneko T., Similauer P., Joyce B.A., Kawamura T., Vvedensky D.D. Phys. Rev. Lett. 74:1995;3298.
11. Eberl K., Kaneko T., Maier S. Electrochem. Soc. Proc. 97-21:1997;259-269.
12. Zhang J., Naji O.P., Steans P., Tejedor P., Kaneko T., Jones T.S., Joyce B.A. J. Cryst. Growth. 175/176:1997;1284-1288.
13. H. Schuler, M. Lipinski, K. Eberl, J. Cryst. Growth (1999), in press.
14. Ledentsov N.N., Shchukin V.A., Grundmann M., Kirstaedter N., Böhrer J., Schmidt O.G., Bimberg D., Ustinov V.M., Egorov A.Yu., Zhukov A.E., Kopév P.S., Zaitsev S.V., Alferov Zh.I., Borovkov A.I., Kosogov A.O., Rivimov S.S., Werner P., Gösele U., Heydenreich J. Phys. Rev. B. 54:1996;8743.
15. Schuler H., Jin-Phillipp N.Y., Phillipp F., Eberl K. Sem. Sci. Technol. 13:(11):1998;1341.