Structural Analysis of a Carbon Nitride Film Prepared by Ion-Beam-Assisted Deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 4 PART 2, 1999, Pages 395-397

  Hayashi, Toshiyuki ^a   Matsumuro, Akihito ^a   Muramatsu, Mutsuo ^a   Kohzaki, Masao ^a   Takahashi, Yutaka ^b   Yamaguchi, Katsumi ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b MIE UNIVERSITY   (Japan)

Author keywords

Carbon nitride; Ion beam assisted deposition; Microstructure; Structural analysis; Transmission electron diffraction; Transmission electron microscopy

Indexed keywords

CRYSTAL MICROSTRUCTURE; DEPOSITION; ELECTRON DIFFRACTION; FILM PREPARATION; ION BEAMS; SILICON WAFERS; TRANSMISSION ELECTRON MICROSCOPY;

CARBON NITRIDE; ION BEAM ASSISTED DEPOSITION (IBAD); TRANSMISSION ELECTRON DIFFRACTION (TED);

NITRIDES;

EID: 0032647761     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.l395     Document Type: Article

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