Fabrication of free standing structure using single step electrochemical etching in hydrofluoric acid

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 1998, Pages 246-250

  Ohji, H ^a   Trimp, P J ^a   French, P J ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; ELECTROCHEMISTRY; ETCHING; HYDROFLUORIC ACID; MICROMACHINING; POROUS MATERIALS; SINGLE CRYSTALS;

ELECTROCHEMICAL ETCHING; FREE STANDING STRUCTURES;

SEMICONDUCTING SILICON;

EID: 0031653882     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)