Advanced micromachine fabrication using ion-implanted layers

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 155, Issue 1, 1999, Pages 79-84

  Nakano, S ^a   Ogiso, H ^a,b   Yabe, A ^a  

^a Advanced Machinery Department   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; ETCHING; GOLD; MASKS; MICROMACHINING; MICROSTRUCTURE; POTASSIUM COMPOUNDS; RESIDUAL STRESSES; SEMICONDUCTOR DEVICE STRUCTURES; SILICON WAFERS; TITANIUM;

MICROMACHINES;

ION IMPLANTATION;

EID: 0032629769     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00251-7     Document Type: Article

References (9)

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