Triode magnetron sputtering TiN film deposition

Surface and Coatings Technology

Volumn 114, Issue 1, 1999, Pages 7-12

  Fontana, L C ^a   Muzart, J L R ^b  

^a SANTA CATARINA STATE UNIVERSITY   (Brazil)

^b LABMAT   (Brazil)

Author keywords

Magnetron sputtering; Reactive TiN film; Triode configuration

Indexed keywords

ARGON; ELECTRIC CURRENT MEASUREMENT; GLOW DISCHARGES; HYSTERESIS; NITROGEN; PRESSURE; SPUTTER DEPOSITION; TITANIUM NITRIDE;

IDENTICAL CURRENTS; REACTIVE FILM DEPOSITION; TRIODE CONFIGURATION;

MAGNETRON SPUTTERING;

EID: 0032629554     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00032-8     Document Type: Article

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