SCOPUS 정보 검색 플랫폼

Applied Surface Science

Volumn 147, Issue 1, 1999, Pages 94-100

Characterization of RuO2 films prepared by rf reactive magnetron sputtering

(2) Meng, Li Jian a Dos Santos, M P b

a INSTITUTO SUPERIOR DE ENGENHARIA DO PORTO (Portugal)

b UNIVERSITY OF MINHO (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; ELECTRIC CONDUCTIVITY; FILM PREPARATION; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; STRESSES; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS;

OXYGEN PARTIAL PRESSURE; RADIO FREQUENCE REACTIVE MAGNETRON SPUTTERING; RUTHENIUM DIOXIDE;

RUTHENIUM COMPOUNDS;

EID: 0032626189 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(99)00089-6 Document Type: Article

Times cited : (20)

References (16)

1
- 0020087867
- McEvoy A.J., Gissler W. J. Appl. Phys. 52:1982;1251.
- (1982) J. Appl. Phys. , vol.52 , pp. 1251
- McEvoy, A.J.¹ Gissler, W.²

2
- 0029254262
- Al-Shareef H.N., Bellur K.R., Auciello O., Kinggon A.I. Thin Solid Films. 256:1995;73.
- (1995) Thin Solid Films , vol.256 , pp. 73
- Al-Shareef, H.N.¹ Bellur, K.R.² Auciello, O.³ Kinggon, A.I.⁴

3
- 0141444497
- Elbaum L.K., Wittmer M., Yee D.S. Appl. Phys. Lett. 50:1987;1879.
- (1987) Appl. Phys. Lett. , vol.50 , pp. 1879
- Elbaum, L.K.¹ Wittmer, M.² Yee, D.S.³

4
- 21544465961
- Takemura K., Sakuma T., Miyasaka Y. Appl. Phys. Lett. 64:1994;2967.
- (1994) Appl. Phys. Lett. , vol.64 , pp. 2967
- Takemura, K.¹ Sakuma, T.² Miyasaka, Y.³

5
- 21544479801
- Kolawa E., So F.C.T., Pan E.T.S., Nicolet M.A. Appl. Phys. Lett. 50:1987;854.
- (1987) Appl. Phys. Lett. , vol.50 , pp. 854
- Kolawa, E.¹ So, F.C.T.² Pan, E.T.S.³ Nicolet, M.A.⁴

6
- 0031277213
- Bai G.R., Wang A., Foster C.M., Vetrone J. Thin Solid Films. 310:1997;75.
- (1997) Thin Solid Films , vol.310 , pp. 75
- Bai, G.R.¹ Wang, A.² Foster, C.M.³ Vetrone, J.⁴

7
- 0031274898
- Patil P.S., Ennaoui E.A., Lokhande C.D., Muller M., Giersig M., Diesner K., Tributsch H. Thin Solid Films. 310:1997;57.
- (1997) Thin Solid Films , vol.310 , pp. 57
- Patil, P.S.¹ Ennaoui, E.A.² Lokhande, C.D.³ Muller, M.⁴ Giersig, M.⁵ Diesner, K.⁶ Tributsch, H.⁷

8
- 0001674742
- Hong S.K., Kim H.J., Yang H.G. J. Appl. Phys. 80:1996;822.
- (1996) J. Appl. Phys. , vol.80 , pp. 822
- Hong, S.K.¹ Kim, H.J.² Yang, H.G.³

9
- 0001306657
- Jia Q.X., Song S.G., Wu X.D., Cho J.H., Foltyn S.R., Findikoglu A.T., Smith J.L. Appl. Phys. Lett. 68:1996;1069.
- (1996) Appl. Phys. Lett. , vol.68 , pp. 1069
- Jia, Q.X.¹ Song, S.G.² Wu, X.D.³ Cho, J.H.⁴ Foltyn, S.R.⁵ Findikoglu, A.T.⁶ Smith, J.L.⁷

10
- 0001389968
- Lee J.G., Kim Y.T., Min S.K., Choh S.H. J. Appl. Phys. 77:1995;5473.
- (1995) J. Appl. Phys. , vol.77 , pp. 5473
- Lee, J.G.¹ Kim, Y.T.² Min, S.K.³ Choh, S.H.⁴

11
- 0000597753
- Mar S.Y., Chen C.S., Huang Y.S., Tiong K.K. Applied Surface Science. 90:1995;497.
- (1995) Applied Surface Science , vol.90 , pp. 497
- Mar, S.Y.¹ Chen, C.S.² Huang, Y.S.³ Tiong, K.K.⁴

12
- 0032361550
- Meng L.J., Fortunato E., Nunos R., dos Santos M.P. J. Korean Phys. Soc. 32:1998;S1835.
- (1998) J. Korean Phys. Soc. , vol.32 , pp. 1835
- Meng, L.J.¹ Fortunato, E.² Nunos, R.³ Dos Santos, M.P.⁴

13
- 0037997768
- Joint Committee on Powder Diffraction Standards ASTM, Philadelphia, PA, 1967 Card 43-1027
- Powder Diffraction File, Joint Committee on Powder Diffraction Standards, 1967, ASTM, Philadelphia, PA, 1967 Card 43-1027.
- (1967) Powder Diffraction File

14
- 0016083153
- Thornton J.A. J. Vac. Sci. Technol. 11:1974;666.
- (1974) J. Vac. Sci. Technol. , vol.11 , pp. 666
- Thornton, J.A.¹

15
- 0028194521
- Mar S.Y., Liang J.S., Sun C.Y., Huang Y.S. Thin Solid Films. 238:1994;158.
- (1994) Thin Solid Films , vol.238 , pp. 158
- Mar, S.Y.¹ Liang, J.S.² Sun, C.Y.³ Huang, Y.S.⁴

16
- 0020179418
- Huang Y.S., Pollak F.H. Solid State Commun. 43:1982;921.
- (1982) Solid State Commun. , vol.43 , pp. 921
- Huang, Y.S.¹ Pollak, F.H.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.