Effect of substrate temperature on the properties of RuO2 films prepared by RF reactive magnetron sputtering

Journal of the Korean Physical Society

Volumn 32, Issue 4 SUPPL., 1998, Pages

  Meng, Li Jian ^a   Fortunato, E ^b   Nunos, R ^b   Dos Santos, M P ^c  

^a INSTITUTO SUPERIOR DE ENGENHARIA DO PORTO   (Portugal)

^b Center of Excellence in Microelectronics Optoelectronics and Processes   (Portugal)

^c UNIVERSITY OF MINHO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032361550     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (16)

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