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Volumn 18, Issue 11, 1997, Pages 512-514

Thermal mapping of interconnects subjected to brief electrical stresses

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; ELECTRIC DISCHARGES; ELECTROSTATICS; LASER APPLICATIONS; TEMPERATURE DISTRIBUTION; THERMOMETERS;

EID: 0031268399     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.641429     Document Type: Article
Times cited : (22)

References (11)
  • 1
    • 84937650904 scopus 로고
    • Electromigration - A brief survey and some recent results
    • J. R. Black, "Electromigration - A brief survey and some recent results," IEEE Trans. Electron Devices, vol. ED-16, pp. 338-347, 1969.
    • (1969) IEEE Trans. Electron Devices , vol.ED-16 , pp. 338-347
    • Black, J.R.1
  • 2
    • 0030150128 scopus 로고    scopus 로고
    • Modeling and characterization of electromigration failures under bidirectional current stress
    • J. Tao, J. F. Chen, N. W. Cheung, and C. Hu, "Modeling and characterization of electromigration failures under bidirectional current stress," IEEE Trans. Electron Devices, vol. 43, pp. 800-808, 1996.
    • (1996) IEEE Trans. Electron Devices , vol.43 , pp. 800-808
    • Tao, J.1    Chen, J.F.2    Cheung, N.W.3    Hu, C.4
  • 3
    • 0027685138 scopus 로고
    • Short-time failure of metal interconnect caused by current pulses
    • J. E. Murguia and J. B. Bernstein, "Short-time failure of metal interconnect caused by current pulses," IEEE Electron Device Lett., vol. 14, pp. 481-483, 1993.
    • (1993) IEEE Electron Device Lett. , vol.14 , pp. 481-483
    • Murguia, J.E.1    Bernstein, J.B.2
  • 5
    • 0022212124 scopus 로고
    • Transmission line pulsing technique for circuit modeling of ESD phenomena
    • T. J. Maloney and N. Khurana, "Transmission line pulsing technique for circuit modeling of ESD phenomena," in Proc. EOS/ESD Symp., 1985, pp. 49-54.
    • (1985) Proc. EOS/ESD Symp. , pp. 49-54
    • Maloney, T.J.1    Khurana, N.2
  • 6
    • 0029700866 scopus 로고    scopus 로고
    • Characterization of VLSI interconnect heating and failure under ESD conditions
    • K. Banerjee, A. Amerasekera, and C. Hu, "Characterization of VLSI interconnect heating and failure under ESD conditions," in Proc. IEEE Int. Reliab. Phys. Symp., 1996, pp. 237-245.
    • (1996) Proc. IEEE Int. Reliab. Phys. Symp. , pp. 237-245
    • Banerjee, K.1    Amerasekera, A.2    Hu, C.3
  • 7
    • 0343038139 scopus 로고
    • High-resolution temperature measurement of void dynamics induced by electromigration in aluminum metallization
    • S. Kondo and K. Hinode, "High-resolution temperature measurement of void dynamics induced by electromigration in aluminum metallization," Appl. Phys. Lett., vol. 67, pp. 1606-1608, 1995.
    • (1995) Appl. Phys. Lett. , vol.67 , pp. 1606-1608
    • Kondo, S.1    Hinode, K.2
  • 8
    • 0029212940 scopus 로고
    • Temperature measurement of Al metallization and the study of Black's model in high current density
    • M. Sakimoto, T. Itoo, T. Fuji, H. Yamaguchi, and K. Eguchi, "Temperature measurement of Al metallization and the study of Black's model in high current density," in Proc. IEEE Int. Reliab. Phys. Symp., 1995, pp. 333-341.
    • (1995) Proc. IEEE Int. Reliab. Phys. Symp. , pp. 333-341
    • Sakimoto, M.1    Itoo, T.2    Fuji, T.3    Yamaguchi, H.4    Eguchi, K.5
  • 9
    • 0027629313 scopus 로고
    • Thermoreflectance optical test probe for the measurement of current-induced temperature changes in microelectronic components
    • W. Clayes, S. Dilhaire, V. Quintard, J. P. Dom, and Y. Danto, "Thermoreflectance optical test probe for the measurement of current-induced temperature changes in microelectronic components," Reliab. Eng. Int., vol. 9, pp. 303-308, 1993.
    • (1993) Reliab. Eng. Int. , vol.9 , pp. 303-308
    • Clayes, W.1    Dilhaire, S.2    Quintard, V.3    Dom, J.P.4    Danto, Y.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.