Optical properties of low-pressure metalorganic vapor phase epitaxy AlxGa1-xN thin-film waveguides by prism coupling technique

Applied Physics Letters

Volumn 74, Issue 26, 1999, Pages 3960-3962

  Dogheche, E ^a   Remiens, D ^a   Omnes, F ^b  

^a UNIVERSITÉ DE VALENCIENNES   (France)

^b CRHEA CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT TRANSMISSION; METALLORGANIC VAPOR PHASE EPITAXY; NITRIDES; OPTICAL FILMS; PRISMS; REFRACTIVE INDEX; SAPPHIRE; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING FILMS; SEMICONDUCTOR GROWTH; THIN FILMS;

ALUMINUM GALLIUM NITRIDE; PRISM COUPLING TECHNIQUE; THIN FILM WAVEGUIDES;

OPTICAL WAVEGUIDES;

EID: 0032614050     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124236     Document Type: Article

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