메뉴 건너뛰기




Volumn 75, Issue 4, 1999, Pages 498-500

Dynamics of the excimer laser annealing of hydrogenated amorphous silicon thin films

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY MEASUREMENT; EXCIMER LASERS; LASER PULSES; MELTING; RAMAN SPECTROSCOPY; THIN FILMS;

EID: 0032607019     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124428     Document Type: Article
Times cited : (17)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.