Microstructures of parylene-N thin films and the effect on copper diffusion

Journal of Electronic Materials

Volumn 25, Issue 11, 1996, Pages 1778-1783

  Yang, G R ^a   Mathur, D ^a   Wu, X M ^a   Dabral, S ^a,c   Mc Donald, J F ^a   Lu, T M ^a   Bakhru, H ^b  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b STATE UNIVERSITY OF NEW YORK   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

Cu diffusion; Films; Microstructure; Parylene N

Indexed keywords

EID: 0001117495     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-996-0035-y     Document Type: Article

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