In situ growth and characterization of ultrahard thin films

Microscopy Research and Technique

Volumn 42, Issue 4, 1998, Pages 295-301

  Bengu, E ^a   Collazo Davila, C ^a   Grozea, D ^a   Landree, E ^a   Widlow, I ^a   Guruz, M ^a   Marks, L D ^a  

^a Northwestern University   (United States)

Author keywords

Electron microscopy; Thin film deposition; Ultrahard thin films

Indexed keywords

BORON NITRIDE; ELECTRON MICROSCOPES; ELECTRON MICROSCOPY; FILM GROWTH; III-V SEMICONDUCTORS; ION BEAM ASSISTED DEPOSITION; ION BEAMS; MOLECULAR BEAM EPITAXY; NITRIDES;

DEPOSITION SYSTEMS; IN-SITU CHARACTERIZATION; IN-SITU GROWTH; IN-SITU INVESTIGATIONS; ION BEAM-ASSISTED DEPOSITION; MOLECULAR-BEAM EPITAXY; SURFACE SCIENCE; THIN-FILM DEPOSITIONS; THIN-FILMS; ULTRAHARD THIN FILM;

THIN FILMS;

ARTICLE; CHEMICAL STRUCTURE; ELECTRON MICROSCOPY; EQUIPMENT; EXPERIMENTATION; FILM; IMAGE DISPLAY; PRIORITY JOURNAL; STRUCTURE ANALYSIS;

EID: 0032528960     PISSN: 1059910X     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1097-0029(19980915)42:4<295::AID-JEMT8>3.0.CO;2-P     Document Type: Article

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