Carbon nucleation on Si(100) using a negative carbon ion beam

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 5, 1997, Pages 2750-2754

  Ko, Y W ^a   Kim, S I ^a  

^a Stevens Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031536043     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580818     Document Type: Article

References (17)

1. P. C. Yang, W. Zhu, and J. T. Glass, J. Mater. Res. 8, 1773 (1993).
2. A. Argoitia and J. C. Angus, J. Appl. Phys. 73, 4305 (1993).
3. K. Tamaki, Y. Watanabe, and S. Hirajama, Thin Solid Films 236, 115 (1993).
4. C. M. Niu, G. Tsagaropoulos, and J. Baglio, J. Solid State Chem. 91, 47 (1991).
5. S. Yugo, T. Kimura, and T. Kanai, Diam. Relat. Mater. 2, 328 (1992).
6. Y. Park, Y. W. Ko, M. H. Sohn, and S. I. Kim, Mater. Res. Soc. Symp. Proc. 396, 623 (1996).
7. M. J. Cardillo and G. E. Becker, Phys. Rev. B 21, 1494 (1980).
8. J. A. Martin-Gargo, J. Fraxedas, S. Ferrer, and F. Comin, Surf. Sci. 260, L17 (1992).
9. T. W. Mass, J. T. Grant, and G. J. Dooley, III, J. Appl. Phys. 43, 1853 (1972).
10. P. G. Lurie and J. M. Wilson, Surf. Sci. 65, 476 (1977).
11. S. R. Kasi, H. Kang, and J. W. Rabalais, J. Chem. Phys. 88, 5914 (1988).
12. A. K. Green and V. Rehn, J. Vac. Sci. Technol. A 1, 1877 (1983).
13. E. Grossman, G. D. Lempert, J. Kulik, D. Marton, J. W. Rabalasis, and Y. Lifshitz, Appl. Phys. Lett. 68, 1214 (1996).
14. B. B. Pate, Surf. Sci. 165, 83 (1986).
15. J. J. Cuomo, D. L. Pappas, J. Bruley, and J. P. Doyle, J. Appl. Phys. 70, 1706 (1991).
16. J. C. Angus, P. Koidl, and S. Domitz, in Plasma Deposited Thin Films, edited by J. Mort and F. Jansen (Chemical Rubber, Boca Raton, FL, 1986), Chap. 4.
17. H. Tsai and D. B. Bogi, J. Vac. Sci. Technol. A 5, 3287 (1987).