Effects of fluorine addition on the structure and optical properties of SiO2 films formed by plasma-enhanced chemical vapor deposition

Journal of Applied Physics

Volumn 81, Issue 3, 1997, Pages 1470-1474

  Ishii, K ^a   Takami, A ^a   Ohki, Y ^a  

^a WASEDA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005066389     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363900     Document Type: Article

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