Measurement of mid-spatial frequency scatter in extreme ultraviolet lithography systems using direct aerial image measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3048, Issue , 1997, Pages 356-367

  Fields, C H ^a   RayChaudhuri, A K ^b   Krenz, K D ^b   Oldham, W G ^a   Stulen, R H ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

Aerial image measurement; EUV; Extreme ultraviolet; Lithography; Metrology; Optics testing; Scatter

Indexed keywords

CAMERAS; EXTREME ULTRAVIOLET LITHOGRAPHY; LASER PRODUCED PLASMAS; LIGHT; LITHOGRAPHY; MEASUREMENT; OPTICAL TRANSFER FUNCTION; PLASMA INTERACTIONS; SCATTERING; SURFACE ROUGHNESS;

AERIAL IMAGE MEASUREMENT; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET LASERS; HIGH QUANTUM EFFICIENCY; IN-SITU CHARACTERIZATION; SANDIA NATIONAL LABORATORIES; SILICON PHOTODIODE; TECHNIQUE MEASURES;

ANTENNAS;

EID: 0010412715     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.275798     Document Type: Conference Paper

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