In situ conductivity characterization of oxide thin film growth phenomena on microhotplates

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 1, 1998, Pages 131-138

  DiMeo Jr , F ^a,c   Cavicchi, R E ^a   Semancik, S ^a   Suehle, J S ^a   Tea, N H ^a   Small, J ^a   Armstrong, J T ^a   Kelliher, J T ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b Microelectronics Research Laboratory   (United States)

^c Advanced Technology Materials Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032358891     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580959     Document Type: Article

References (12)

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7. Commercial products are identified only to specify experimental procedure. This in no way implies recommendation or endorsement by the National Institute of Standards and Technology.
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