MOCVD of SnO2 on silicon microhotplate arrays for use in gas sensing applications

Materials Research Society Symposium - Proceedings

Volumn 415, Issue , 1996, Pages 231-236

  Dimeo Jr , F ^a   Semancik, S ^a   Cavicchi, R E ^a   Suehle, J S ^a   Chaparala, P ^a   Tea, N H ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL SENSORS; ELECTRIC CONTACTS; ELECTRIC RESISTANCE MEASUREMENT; FABRICATION; GAS DETECTORS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROMACHINING; SEMICONDUCTING SILICON; THERMOMETERS; THIN FILMS;

IN SITU GROWTH MEASURE MEASUREMENT; SILICON MICROHOTPLATE ARRAYS; SILICON MICROMACHINING TECHNIQUES; TAGUCHI SENSOR; THIN FILM THERMOMETER;

OXIDES;

EID: 0029732311     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)