Plasma-enhanced chemical vapor deposition of intrinsic microcrystalline silicon from chlorine-containing source gas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 6, 1998, Pages 3218-3222

  Platz, R ^a   Wagner, S ^a  

^a Princeton University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032332713     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581525     Document Type: Article

References (24)

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