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Volumn 333, Issue 1-2, 1998, Pages 142-149

A comparative study on the nucleation and growth of ECR-PECVD PLZT ((Pb,La)(Zr,Ti)O3) thin films on Pt/SiO2/Si substrates and on Pt/Ti/SiO2/Si substrates

(2) Shin, Joong Shik a Lee, Won Jong a

a Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

Author keywords

(Pb,La)(Zr,Ti)O3 (PLZT); Film; Interface; Nucleation; Plasma enhanced chemical vapor deposition (PECVD)

Indexed keywords

FERROELECTRIC MATERIALS; LANTHANUM COMPOUNDS; LEAD COMPOUNDS; NUCLEATION; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TITANIUM DIOXIDE; ZIRCONIA;

PLZT COMPOUNDS;

THIN FILMS;

EID: 0032203070 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(98)00555-0 Document Type: Article

Times cited : (6)

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