Adsorption of disilane on Si(111)-(7 × 7) and initial stages of CVD growth

Surface Science

Volumn 416, Issue 1-2, 1998, Pages 226-239

  Braun, J ^a   Rauscher, H ^a   Behm, R J ^a  

^a UNIVERSITY OF ULM   (Germany)

Author keywords

Chemical vapor deposition; Chemisorption; Disilane; Scanning tunneling microscopy; Silicon; Surface reactions

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CHEMISORPTION; DISSOCIATION; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; SILANES;

ADATOMS; DISILANES;

SURFACE CHEMISTRY;

EID: 0032182263     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(98)00586-X     Document Type: Article

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