Reduction in contact resistance with in situ O2 plasma treatment

Journal of the Electrochemical Society

Volumn 145, Issue 7, 1998, Pages 2480-2485

  Yonekura, Kazumasa ^a   Sakamori, Shigenori ^a   Kawai, Kenji ^a   Miyatake, Hiroshi ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONTACTS; ELECTRIC RESISTANCE; FLUORINE COMPOUNDS; OXYGEN; REACTIVE ION ETCHING; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON TETRAFLUORIDE; PLASMA TREATMENT; THERMAL WAVE MODULATED REFLECTANCE;

PLASMA ETCHING;

EID: 0032124055     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838664     Document Type: Article

References (13)

1. G. S. Oehrlein, R. M. Tromp, J. C. Tsang, Y. H. Lee, and E. J. Petrillo, J. Electrochem. Soc., 132, 1441 (1985).
2. C. Cardinaud, A. Rhounna, G. Turban, and B. Grolleau, J. Electrochem. Soc., 135, 1472 (1988).
3. K. Hashimi, D. Matsunaga, M. Kanazawa, M. Tomoyasu, A. Koshiishi, and M. Ogasawara, in Proceedings of the 17th Symposium on Dry Process, p. 207, The Institute of Electricl Engineers of Japan, Tokyo (1995).
4. T. Kaminishizono, T. Akimoto, and E. Ikawa, in Proceedings of the 17th Symposium on Dry Process, p. 213, The Institute of Electricl Engineers of Japan, Tokyo (1995).
5. K. H. Kwon, H. H. Park, K. S. Kim, C. I. Kim, and Y. K. Sung, Jpn. J. Appl. Phys., 35, 1611 (1996).
6. K. Yagi, M. Matsui, F. Uchida, and T. Tokunaga, in Proceedings of the 17th Symposium on Dry Process, p. 201, The Institute of Electricl Engineers of Japan, Tokyo (1995).
7. G. S. Oehrlein, J. Vac. Sci. Technol, A11, 34 (1993).
8. Y. Tezuka, N. Kitano, and N. Nakano, J. Electrochem. Soc., 142, 3569 (1995).
9. K. Reinhardt and F. Dumesnil, in Proc. SPIE, 1593, 32 (1991) SPIE-Int. Soc. Opt. Eng.
10. W. Nam, G. Yeom, J. Kim, K. Whang, and J. Yoon, J. Vac. Sci. Technol., A15, 590 (1997).
11. C. L. Goff, M. C. Peignon, and G. Turban, J. Vac. Sci. Technol., A15, 579 (1997).
12. N. Aoto, M. Nakamori, S. Yamasaki, and H. Hada, J. Appl. Phys., 77, 3899 (1995).
13. M. C. Peignon, F. Clénet, and G. Turban, J. Electrochem. Soc., 143, 1347 (1996).