Aspect ratio effects in submicron contact hole plasma etching investigated by quantitative x-ray photoelectron spectroscopy

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 3, 1997, Pages 579-584

  Le Goff, C ^a   Peignon, M C ^a   Turban, G ^a   Bilhant, R ^b  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

^b Matra MHS TEMIC   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5844289086     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580687     Document Type: Article

References (21)

1. J. Viktavage, A. Kornblit, R. A. Nicholas, D. P. Favreau, and S. C. McNevin, Tegal Plasma Proceedings Symposium, San Francisco, California, 1991 (unpublished).
2. R. A. Gottscho, C. W. Jurgensen, and D. J. Vitkavage, J. Vac. Sci. Technol. B 10, 2133 (1992).
3. O. Joubert, G. S. Oehrlein, M. Surendra, and Y. Zhang, J. Vac. Sci. Technol. A 12, 1957 (1994).
4. H. Shan, B. K. Srinivasan, D. W. Jillie, J. S. Multani, and W. J Lo, J. Electrochem. Soc. 141, 2904 (1994).
5. Y. H. Lee and Z. H. Zhou, Proceedings of the 8th Symposium on Plasma Processing, 1990 (unpublished), Vol. 90-2, p. 45.
6. E. S. G. Shaqfeh and C. W. Jurgensen, J. Appl. Phys. 66, 4664 (1989).
7. J. H. Thomas III, C. E. Bryson III, and T. R. Pampelone, J. Vac. Sci. Technol. B 6, 1081 (1988).
8. M. C. Peignon and F. Clénet, G. Turban, J. Electrochem. Soc. 143, 1347 (1996).
9. G. S. Oehrlein, S. W. Robey, and M. A. Jaso, Mater. Res. Soc. Symp. Proc. 98, 229 (1987).
10. Ch. Cardinaud, A. Rhounna, G. Turban, and B. Grolleau, Rev. Phys. Appl. 24, 309 (1989).
11. J. W. Coburn and H. F. Winters, J. Vac. Sci. Technol. 16, 391 (1979).
12. Ch. Cardinaud, M. C. Peignon, and G. Turban, J. Electrochem. Soc. 138, 284 (1991).
13. O. Joubert, P. Czuprynski, F. H. Bell, P. Berruyer, and R. Blanc (unpublished).
14. H.-H. Park, K.-H. Kwon, J.-L. Lee, K.-S. Suh, O.-J. Kwon, K.-I. Cho, and S.-C. Park, J. Appl. Phys. 76, 4596 (1994).
15. F. H. Bell, O. Joubert, G. S. Oehrlein, Y. Zhang, and D. Vender, J. Vac. Sci. Technol. A 12, 3095 (1994).
16. Y. Tezuka, N. Kitano, and N. Nakano, J. Electrochem. Soc. 142, 3569 (1995).
17. G. S. Oehrlein, G. J. Coyle, J. G. Clabes, and Y. H. Lee, Surf. Interface Anal. 9, 275 (1986).
18. R. A. Gottscho and C. W. Jurgensen, J. Vac. Sci. Technol. B 10, 2133 (1992).
19. C. D. Wagner, Practical Surface Analysis by Auger and XPS, edited by E. Briggs and M. P. Seah (Wiley, New York, 1983).
20. S. Tanuma, C. J. Powell, and D. R. Penn, Surf. Interface Anal. 17, 911 (1991); 17, 927 (1991).
21. S. Tanuma, C. J. Powell, and D. R. Penn, Surf. Interface Anal. 17, 911 (1991); 17, 927 (1991).