Physical damage and contamination by magnetized inductively coupled plasmas and effects of various cleaning and annealing methods

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 3, 1997, Pages 590-595

  Nam, Wook Jun ^a   Yeom, Geun Young ^a   Kim, Jung Hun ^b   Whang, Ki Woong ^b   Yoon, Jong Ku ^c  

^a Sungkyunkwan University   (South Korea)

^b Seoul National University   (South Korea)

^c Natl Inst of Technol and Quality   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0342939051     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580689     Document Type: Article

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