In situ scanning tunneling microscopy nanotip fabrication with field-enhanced surface diffusion, thermal evaporation and field emission

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 6 SUPPL. B, 1998, Pages 3824-3827

  Huang, Dehuan ^a   Yamaguchi, Fumiko ^b   Yamamoto, Yoshihisa ^a,b  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b STANFORD UNIVERSITY   (United States)

Author keywords

Field emission; Field enhanced surface diffusion; STM; Thermal evaporation; Tungsten nanotip

Indexed keywords

DIFFUSION IN SOLIDS; EVAPORATION; NANOSTRUCTURED MATERIALS; SILICON WAFERS; SURFACE PHENOMENA; TUNGSTEN; VACUUM APPLICATIONS;

FIELD EMISSION; FIELD ENHANCED SURFACE DIFFUSION; THERMAL EVAPORATION; TUNGSTEN NANOTIP; ULTRAHIGH VACUUM CHAMBERS;

SCANNING TUNNELING MICROSCOPY;

EID: 0032091480     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.3824     Document Type: Article

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