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Volumn 120, Issue 1-4, 1996, Pages 282-285

Investigation of plasma immersion ion implanted niobium oxide and titanium nitride films by nanohardness measurement

Author keywords

[No Author keywords available]

Indexed keywords

HARDNESS; NIOBIUM COMPOUNDS; PLASMA APPLICATIONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SURFACE TREATMENT; THIN FILMS; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

EID: 0030566610     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(96)00527-7     Document Type: Article
Times cited : (5)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.