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Volumn 396, Issue , 1996, Pages 521-525

Apparatus for magnetron sputter coating and plasma immersion ion implantation

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; ELECTRON CYCLOTRON RESONANCE; ION IMPLANTATION; MAGNETIC FIELDS; MAGNETRON SPUTTERING; PLASMA SOURCES; PULSE GENERATORS; SOLENOIDS; THIN FILMS;

EID: 0029697216     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (15)

References (15)
  • Reference 정보가 존재하지 않습니다.

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.