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Volumn 21, Issue 12, 1996, Pages 56-61

A path to nanolithography

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EID: 0006274655     PISSN: 08837694     EISSN: None     Source Type: Journal    
DOI: 10.1557/s0883769400032127     Document Type: Article
Times cited : (51)

References (26)
  • 2
    • 0001111791 scopus 로고
    • For recent reviews, see G. Owen, ibid. B8 (1990) p. 1889; ibid., SPIE Proc. 1924 (1993) p. 114.
    • (1990) J. Vac. Sci. Technol. , vol.B8 , pp. 1889
    • Owen, G.1
  • 3
    • 0001111791 scopus 로고
    • For recent reviews, see G. Owen, ibid. B8 (1990) p. 1889; ibid., SPIE Proc. 1924 (1993) p. 114.
    • (1990) J. Vac. Sci. Technol. , vol.B8 , pp. 1889
    • Owen, G.1
  • 4
    • 85081472201 scopus 로고
    • For recent reviews, see G. Owen, ibid. B8 (1990) p. 1889; ibid., SPIE Proc. 1924 (1993) p. 114.
    • (1993) SPIE Proc. , vol.1924 , pp. 114
  • 7
    • 0642355970 scopus 로고
    • Materials - Fabrication and Patterning at the Nanoscale
    • Pittsburgh
    • Materials - Fabrication and Patterning at the Nanoscale, edited by F. Cerrina and C. Marrian (Mater. Res. Soc. Symp. Proc. 380, Pittsburgh, 1995).
    • (1995) Mater. Res. Soc. Symp. Proc. , vol.380
    • Cerrina, F.1    Marrian, C.2
  • 13
    • 85081463135 scopus 로고    scopus 로고
    • U.S. Patent Application (November 3, 1995)
    • M.C. Peckerar and C.R.K. Marrian, U.S. Patent Application (November 3, 1995); F.K. Perkins, D. McCarthy, C.R.K. Marrian, and M.C. Peckerar, SPIE Proc. 2723, edited by D. Seeger (1996).
    • Peckerar, M.C.1    Marrian, C.R.K.2
  • 20
    • 0002753621 scopus 로고
    • Organic Resist Materials
    • edited by L.F. Thompson, C.G. Willson, and M.J. Bowden ACS Professional Reference Books, Washington, DC
    • For example see C.G. Willson, "Organic Resist Materials," in Introduction to Microlithography, edited by L.F. Thompson, C.G. Willson, and M.J. Bowden (ACS Professional Reference Books, Washington, DC, 1994).
    • (1994) Introduction to Microlithography
    • Willson, C.G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.