Plasma ion sources CVD plasma aspects, limits and possibilities

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 139, Issue 1-4, 1998, Pages 136-144

  Schram, Daniel C ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Deposition; Ion beam formation; Plasma sources

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ION BEAMS; ION SOURCES; SUBSTRATES; SURFACE TREATMENT;

PLASMA BEAM DEPOSITION;

PLASMA SOURCES;

EID: 0032043272     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)00117-7     Document Type: Article

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