Dominant SiHx radicals in electron cyclotron resonance plasma CVD

Plasma Sources Science and Technology

Volumn 5, Issue 2, 1996, Pages 260-264

  Zhang, Mei ^a   Nakayama, Yoshikazu ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; ELECTRON CYCLOTRON RESONANCE; FILM GROWTH; FILM PREPARATION; MONTE CARLO METHODS; PLASMA APPLICATIONS; PROBABILITY; SEMICONDUCTING FILMS; SEMICONDUCTOR PLASMAS; SILANES; SILICON;

ELECTRON CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR DEPOSITION; PARTICLE BOMBARDMENT;

PLASMA SOURCES;

EID: 0030134588     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/5/2/020     Document Type: Article

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