Prevention of the reduction of CuO during X-ray photoelectron spectroscopy analysis

Surface and Interface Analysis

Volumn 24, Issue 3, 1996, Pages 193-197

  Iijima, Yoshitoki ^a   Niimura, Noriyasu ^a   Hiraoka, Kenzo ^b  

^a JEOL LTD   (Japan)

^b UNIVERSITY OF YAMANASHI   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONS; IRRADIATION; REDUCTION; SURFACE PROPERTIES; X RAY PHOTOELECTRON SPECTROSCOPY;

BIAS VOLTAGE; NON MONOCHROMATIC IRRADIATION; PHOTOELECTRONS; REDUCTION PREVENTION; X RAY IRRADIATION;

COPPER OXIDES;

EID: 0030104151     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199603)24:3<193::AID-SIA94>3.0.CO;2-C     Document Type: Article

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