Pulsed laser deposition of electroceramic thin films

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 842-848

  Mertin, M ^a   Offenberg, D ^a   An, C W ^a,b   Wesner, D A ^a   Kreutz, E W ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC MATERIALS; COMPOSITION; CRYSTAL STRUCTURE; DEPOSITION; ELECTRIC PROPERTIES; ELLIPSOMETRY; LASER ABLATION; PERMITTIVITY; PULSED LASER APPLICATIONS; RAMAN SPECTROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTROCERAMIC THIN FILMS; EXCIMER LASER RADIATION; IMPEDANCE MEASUREMENTS; PLASMA EMISSION SPECTROSCOPY; PLASMA EXPANSION; PLASMA FORMATION; PULSED LASER DEPOSITION; SINTERED TARGETS; TIME OF FLIGHT;

THIN FILMS;

EID: 0030562901     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00569-2     Document Type: Article

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