메뉴 건너뛰기




Volumn 136-138, Issue , 1998, Pages 231-235

Characterization of high nitrogen content carbon nitride thin films by RBS and infrared techniques

Author keywords

Carbon nitride; Chemical composition; IBA techniques; Infrared spectroscopy; Thin film growth

Indexed keywords

CARBON INORGANIC COMPOUNDS; CHEMICAL VAPOR DEPOSITION; COMPOSITION; DENSITY (SPECIFIC GRAVITY); ELLIPSOMETRY; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THIN FILMS;

EID: 0032017651     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(97)00850-1     Document Type: Article
Times cited : (8)

References (15)
  • 13
    • 0008905329 scopus 로고
    • S.M Rossnagel, J.J. Cuomo, W.D. Westwood (Eds.), Noyes, Park Ridge
    • J.L. Checchi, in: S.M Rossnagel, J.J. Cuomo, W.D. Westwood (Eds.), Handbook of Plasma Processing Technology, Noyes, Park Ridge, 1990, p. 14.
    • (1990) Handbook of Plasma Processing Technology , pp. 14
    • Checchi, J.L.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.