An attempt to prepare carbon nitride by thermal plasma chemical vapor deposition from graphite and nitrogen

Journal of Materials Research

Volumn 13, Issue 1, 1998, Pages 180-186

  Matsumoto, S ^a   Chattopadhyay, K K ^a,b   Mieno, M ^a   Ando, T ^a,c  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b JADAVPUR UNIVERSITY   (India)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; GRAPHITE; HYDROGEN; INFRARED SPECTROSCOPY; MASS SPECTROMETRY; NITRIDES; NITROGEN; OXYGEN; PLASMA APPLICATIONS; POWDERS; THERMOGRAVIMETRIC ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; COMBUSTION METHOD; INFRARED ABSORPTION SPECTROSCOPY; THERMAL PLASMA;

CHEMICAL VAPOR DEPOSITION;

EID: 0031650630     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1998.0024     Document Type: Article

References (27)

1. A.M. Liu and M.L. Cohen, Science 245, 841 (1989).
2. J. H. Kaufman, S. Metin, and D. D. Saperstein, Phys. Rev. B 39, 13053 (1989).
3. C. J. Tong, J. M. Sivertsen, J. H. Judy, and C. Chang, J. Mater. Res. 5 2490 (1990).
4. M. Y. Chen, X. Lin, V. P. Dravid, Y. W. Chung, M. S. Wong, and W. D. Sproul, Surf. Coat. Technol. 54/54, 360 (1992).
5. F. Fujimoto and K. Ogata, Jpn. J. Appl. Phys. 32, L420 (1993).
6. C. Niu, Y. Z. Lu, and C. M. Lieber, Science 261, 334 (1993).
7. D. Marton, K. J. Boyd, A. H. Al-Bayati, S. S. Todorov, and J. W. Labalais, Phys. Rev. Lett. 73, 118 (1994).
8. H. X. Han and B. J. Feldman, Solid State Commun. 65, 921 (1988).
9. K. M. Yu, M. L. Cohen, E. E. Haller, W. L. Hansen, A. Y. Liu, and I. C. Wu, Phys. Rev. B 49, 5034 (1994).
10. O. Matsumoto, T. Kotaki, H. Shikano, K. Takemura, and S. Tanaka, J. Electrochem. Soc. 141, L16 (1994).
11. T. Y. Yen and C. P. Chou, Solid State Commun. 95, 281 (1995).
12. X. W. Su, H. W. Song, F. Z. Cui, and W. Z. Li, J. Phys.: Conds. Matter 7, L517 (1995).
13. Y. S. Gu, L. Q. Pan, X. R. Chang, and Z. Z. Tian, J. Mater. Sci. Lett. 14, 1355 (1995).
14. Z. B. Zhang, Y. A. Li, S. S. Xie, and G. Z. Yang, J. Mater. Sci. Lett. 14, 1742 (1995).
15. Y. F. Zhang, Z. H. Zhou, and H. L. Li, Appl. Phys. Lett. 68, 634 (1996).
16. X. W. Su, H. W. Song, Q. Y. Zhang, and F. Z. Cui, Nucl. Instrum. Methods Phys. Res. B 111, 59 (1996).
17. A. K. Sharma, P. Ayyub, M. S. Multani, K. P. Adhi, S. B. Ogale, M. Sunderaraman, D. D. Upadhyay, and S. Banerjee, Appl. Phys. Lett. 69, 3489 (1996).
18. L. C. Chen, C. Y. Yang, D. M. Bhusari, K. H. Chen, M. C. Lin, J. C. Lin, and T. J. Chuang, Diamond Relat. Mater. 5, 514 (1996).
19. Y. Chen, L. Guo, F. Chen, and E. G. Wang, J. Phys.: Conds. Matter 8, L685 (1996).
20. E. Q. Xie and S. Matsumoto, unpublished.
21. S. Matsumoto, unpublished data.
22. S. Matsumoto, I. Hosoya, Y. Manabe, and Y. Hibino, Pure Appl. Chem. 64, 75 (1992).
23. N. Nakayama, Y. Tsuchiya, S. Tamada, K. Kosuge, S. Nagata, K. Takahiro, and S. Yamaguchi, Jpn. J. Appl. Phys. 32, L1465 (1993).
24. X. A. Zhao, C. W. Ong, Y. G. Tsang, Y. W. Wong, P. W. Chen, and C. L. Choy, Appl. Phys. Lett. 66, 2652 (1995).
25. J. J. Cuomo, P. A. Leary, D. Yu, W. Reuter, and M. Frish, J. Vac. Sci. Technol. 16, 299 (1979).
26. F. Rossi, B. André, A. van Veen, P. E. Mijnarends, H. Schut, F. Labohm, H. Dunlop, M. P. Delplancke, and K. Hubbard, J. Mater. Res. 9, 2440 (1994).
27. A. Bousetta, M. Lu, and A. Bensaoula, J. Vac. Sci. Technol. A 13, 1639 (1995).