Structural properties of carbon nitride films prepared by high dose nitrogen implantation into carbon thin films

Journal of Applied Physics

Volumn 79, Issue 5, 1996, Pages 2364-2368

  Xin, Huoping ^a   Lin, Chenglu ^a   Xu, W Ping ^a   Wang, Lianwei ^a   Zou, Shichang ^a   Wu, Xinglong ^b   Shi, Xiaohong ^c   Zhu, Hong ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b NANJING UNIVERSITY   (China)

^c SHANGHAI INSTITUTE OF TECHNICAL PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000613326     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361163     Document Type: Article

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