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Volumn 14, Issue 4, 1996, Pages 2655-2658

Compact electron cyclotron resonance plasma source for molecular beam epitaxy applications

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0030502746     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.579996     Document Type: Article
Times cited : (14)

References (17)
  • 2
    • 21544440282 scopus 로고
    • R. M. Park, M. B. Troffer, C. M. Rouleau, J. M. Depuydt, and M. A. Haase, Appl. Phys. Lett. 57, 2127 (1990); J. Qui, J. M. Depuydt, H. Cheng, and A. Haase, Appl. Phys. Lett. 59, 2992 (1991).
    • (1991) Appl. Phys. Lett. , vol.59 , pp. 2992
    • Qui, J.1    Depuydt, J.M.2    Cheng, H.3    Haase, A.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.