Charge issues in high oxygen gas ratio tetraethylorthosilicate plasma enhanced chemical vapor deposition films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 3, 1996, Pages 709-713

  DeCrosta, D A ^a   Hackenberg, J J ^a  

^a INTERSIL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343562241     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580376     Document Type: Article

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