-
1
-
-
0025241196
-
"SIMOX-SOI Technologies for High Speed and Radiation Hard Technologies: Status and Trends in VLSI and ULSI Applications,"
-
4th International Symposium on SOI Technology and Devices, Electrochem. Soc. Vol. 90, No. 6, pp. 455-478, May 1990.
-
A. J. Auberton-Herve, "SIMOX-SOI Technologies For High Speed and Radiation Hard Technologies: Status and Trends in VLSI and ULSI Applications," Proc. 4th International Symposium on SOI Technology and Devices, Electrochem. Soc. Vol. 90, No. 6, pp. 455-478, May 1990.
-
Proc.
-
-
Auberton-Herve, A.J.1
-
2
-
-
0028694250
-
-
Vol. 41, No. 6, pp. 2317-2321, December 1994.
-
W. C. Jenkins and S. T. Liu, "Radiation Response of Fully-Depleted MOS Transistors Fabricated in SIMOX," IEEE Trans. Nucl. Sei., Vol. 41, No. 6, pp. 2317-2321, December 1994.
-
"Radiation Response of Fully-Depleted MOS Transistors Fabricated in SIMOX," IEEE Trans. Nucl. Sei
-
-
Jenkins, W.C.1
Liu, S.T.2
-
3
-
-
3342956581
-
-
Vol. 65, No. 5, pp. 2993-2995, December 1994.
-
B. J. Mrstik, P. J. McMarr, and R. K. Lawrence, "Relationship Between Radiation Response and Density of Buried Oxide in Seperation-By-Implantation-OfOxygen Material," Appl. Phys. Lett., Vol. 65, No. 5, pp. 2993-2995, December 1994.
-
"Relationship between Radiation Response and Density of Buried Oxide in Seperation-By-Implantation-OfOxygen Material," Appl. Phys. Lett
-
-
Mrstik, B.J.1
McMarr, P.J.2
Lawrence, R.K.3
-
4
-
-
0028713286
-
-
Vol. 41, No. 6, pp. 2277-2283, December 1994.
-
B. J. Mrstik, P. J. McMarr, R. K. Lawrence, and H. L. Hughes, "The Use of Spectroscopic Ellipsometry to Predict the Radiation Response of SIMOX," IEEE Trans. Nucl. Sei., Vol. 41, No. 6, pp. 2277-2283, December 1994.
-
"The Use of Spectroscopic Ellipsometry to Predict the Radiation Response of SIMOX," IEEE Trans. Nucl. Sei
-
-
Mrstik, B.J.1
McMarr, P.J.2
Lawrence, R.K.3
Hughes, H.L.4
-
5
-
-
0029637854
-
-
Vol. 31, No. 14, pp. 1201-1202, July 1995.
-
M. Bruel, "Silicon-On-Insulator Material Technology," Electronic Letters, Vol. 31, No. 14, pp. 1201-1202, July 1995.
-
"Silicon-On-Insulator Material Technology," Electronic Letters
-
-
Bruel, M.1
-
6
-
-
5244297691
-
-
Vol. 18, No. 11, pp. 97-104, October 1995.
-
A J. Auberton-Herve, J. M. Lamure, T. Barge, M. Bruel, B. Aspar, and J. L. Pelloie, "SOI Materials for ULSI Applications," Semicond. Inter., Vol. 18, No. 11, pp. 97-104, October 1995.
-
"SOI Materials for ULSI Applications," Semicond. Inter
-
-
Auberton-Herve, A.J.1
Lamure, J.M.2
Barge, T.3
Bruel, M.4
Aspar, B.5
Pelloie, J.L.6
-
7
-
-
34648853902
-
-
and N. M. Bashara, Ellipsometrv and Polarized Light Amsterdam-New York-Oxford: North Holland Publishing Company, 1977.
-
R. M. A. Azzam and N. M. Bashara, Ellipsometrv and Polarized Light Amsterdam-New York-Oxford: North Holland Publishing Company, 1977.
-
-
-
Azzam, R.M.A.1
-
8
-
-
0026170875
-
-
Vol. 138, No. 6, pp. 1770-1778, June 1991.
-
B. J. Mrstik, P. J. McMarr, J. R. Blanco, and J. M. Bennett, "Measurement of the Thickness and Optical Properties of Thermal Oxides of Si Using Spectroscopic Ellipsometry and Stylus Profilometry," J. Electrochem. Soc. Vol. 138, No. 6, pp. 1770-1778, June 1991.
-
"Measurement of the Thickness and Optical Properties of Thermal Oxides of Si Using Spectroscopic Ellipsometry and Stylus Profilometry," J. Electrochem. Soc
-
-
Mrstik, B.J.1
McMarr, P.J.2
Blanco, J.R.3
Bennett, J.M.4
-
9
-
-
0000439385
-
-
Vol. 112, No. 10, pp. 1013-1019, October 1965.
-
W. A. Pliskin and H. S. Lehman, "Structural Evaluation of Silicon Oxide Films,", J. Electrochem. Soc. Vol. 112, No. 10, pp. 1013-1019, October 1965.
-
"Structural Evaluation of Silicon Oxide Films,", J. Electrochem. Soc
-
-
Pliskin, W.A.1
Lehman, H.S.2
-
10
-
-
0026899019
-
-
5 E 4 V/cm can be found in: J. H. Smith, R. Lawrence, and G. J. Campisi
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The theory for the selection of this field (+ 5 E 4 V/cm) can be found in: J. H. Smith, R. Lawrence, and G. J. Campisi, "Numerical Analysis of Silicon-On-Insulator Short Channel Effects in a Radiation Environment," J. Electron. Mat. Vol. 21, No. 7, pp. 683-687,1992.
-
"Numerical Analysis of Silicon-On-Insulator Short Channel Effects in a Radiation Environment," J. Electron. Mat. Vol. 21, No. 7, pp. 683-687,1992
-
-
-
11
-
-
0030960642
-
-
2 Thin Films," Nature, Vol. 386, pp. 587-589, April 1997.
-
This phenomena may be related to that described by: K. Vanheusden, W. L. Warren, R. A. B. Devine, D. M. Fleetwood, J. R. Schwank, M. R. Shaneyfelt, P. S. Winokur, and Z. J. Lemnios, "Non-volatile Memory Device Based on Mobile Protons in SiO2 Thin Films," Nature, Vol. 386, pp. 587-589, April 1997.
-
"Non-volatile Memory Device Based on Mobile Protons in SiO
-
-
-
12
-
-
0012623945
-
-
Vol. 54, No. 2, pp. 151-152, January 1989.
-
C. S. Rafferty, L. M. Landsberger, R. W. Dutton, and W. A. Tiller, "Nonlinear Viscoelastic Dilation of SiQz Films," Appl. Phys. Lett., Vol. 54, No. 2, pp. 151-152, January 1989.
-
"Nonlinear Viscoelastic Dilation of SiQz Films," Appl. Phys. Lett
-
-
Rafferty, C.S.1
Landsberger, L.M.2
Dutton, R.W.3
Tiller, W.A.4
-
14
-
-
0022957868
-
-
Vol. 2-3, pp. 65-160, December 1986.
-
F. J. Grunthaner and P. J. Grunthaner, "Chemical and Electronic Structure of the SiCySi Interface," in Material Science Reports, Vol. 2-3, pp. 65-160, December 1986.
-
"Chemical and Electronic Structure of the SiCySi Interface," in Material Science Reports
-
-
Grunthaner, F.J.1
Grunthaner, P.J.2
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