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Volumn 44, Issue 6 PART 1, 1997, Pages 2115-2123

The radiation response of capacitors fabricated on bonded silicon-on-insulator substrates

Author keywords

[No Author keywords available]

Indexed keywords

BONDING; CAPACITANCE MEASUREMENT; DENSITY (SPECIFIC GRAVITY); OXIDES; SEMICONDUCTING SILICON COMPOUNDS; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS; SUBSTRATES; VOLTAGE MEASUREMENT; X RAYS;

EID: 0031337846     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: 10.1109/23.659026     Document Type: Article
Times cited : (3)

References (14)
  • 1
    • 0025241196 scopus 로고    scopus 로고
    • "SIMOX-SOI Technologies for High Speed and Radiation Hard Technologies: Status and Trends in VLSI and ULSI Applications,"
    • 4th International Symposium on SOI Technology and Devices, Electrochem. Soc. Vol. 90, No. 6, pp. 455-478, May 1990.
    • A. J. Auberton-Herve, "SIMOX-SOI Technologies For High Speed and Radiation Hard Technologies: Status and Trends in VLSI and ULSI Applications," Proc. 4th International Symposium on SOI Technology and Devices, Electrochem. Soc. Vol. 90, No. 6, pp. 455-478, May 1990.
    • Proc.
    • Auberton-Herve, A.J.1
  • 7
    • 34648853902 scopus 로고    scopus 로고
    • and N. M. Bashara, Ellipsometrv and Polarized Light Amsterdam-New York-Oxford: North Holland Publishing Company, 1977.
    • R. M. A. Azzam and N. M. Bashara, Ellipsometrv and Polarized Light Amsterdam-New York-Oxford: North Holland Publishing Company, 1977.
    • Azzam, R.M.A.1
  • 11
    • 0030960642 scopus 로고    scopus 로고
    • 2 Thin Films," Nature, Vol. 386, pp. 587-589, April 1997.
    • This phenomena may be related to that described by: K. Vanheusden, W. L. Warren, R. A. B. Devine, D. M. Fleetwood, J. R. Schwank, M. R. Shaneyfelt, P. S. Winokur, and Z. J. Lemnios, "Non-volatile Memory Device Based on Mobile Protons in SiO2 Thin Films," Nature, Vol. 386, pp. 587-589, April 1997.
    • "Non-volatile Memory Device Based on Mobile Protons in SiO


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.