Measurement of the Thickness and Optical Properties of Thermal Oxides of Si Using Spectroscopic Ellipsometry and Stylus Profilometry

Journal of the Electrochemical Society

Volumn 138, Issue 6, 1991, Pages 1770-

  Bennett, J M ^c   McMarr, P J ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

^b CALIFORNIA STATE UNIVERSITY   (United States)

^c NAVAL AIR WARFARE CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILMS - THICKNESS MEASUREMENT; SILICA - OPTICAL PROPERTIES;

SPECTROSCOPIC ELLIPSOMETRY; STYLUS PROFILOMETRY;

SEMICONDUCTING SILICON;

EID: 0026170875     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2085871     Document Type: Article

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