Silicon on insulator material technology

Electronics Letters

Volumn 31, Issue 14, 1995, Pages 1201-1202

  Bruel, M ^a  

^a CEA LETI   (France)

Author keywords

Silicon on insulator; Wafer bonding

Indexed keywords

BONDING; CRYSTAL STRUCTURE; DIELECTRIC MATERIALS; ELECTRIC PROPERTIES; HEAT TREATMENT; HYDROGEN; ION IMPLANTATION; POLISHING; SILICON WAFERS;

CHEMOMECHANICAL POLISHING; CRYSTAL QUALITY; HYDROPHILIC BONDING; MICROSLICING; SMART CUT PROCESS; WAFER BONDING;

SILICON ON INSULATOR TECHNOLOGY;

EID: 0029637854     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19950805     Document Type: Article

References (7)

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3. KAMINSKY, M.: ‘Plasma contamination and wall erosion in thermonuclear reactors’, IEEE Trans., 1971, NS-18, (4). pp. 208-217
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6. CHU, W.K., KASTL, R.H., LEVER, R.F., MADER, S., and MASTERS, B.J.: ‘Radiation damage of 50 - 250kev hydrogen ions in silicon’, in: CHERNOV, BORDERS and BRICE (Eds.): Ton implantation in semiconductors’ (Plenum Press, New York, 1977), pp. 483-491
7. CHU, W.K., KASTL, R.H., LEVER, R.F., MADER, S., and MASTERS, B.J.: ‘Distribution of irradiation damage in silicon bombarded with hydrogen’. Phys. Rev. B, 1977. 16. (9), pp. 3851-3859