Analysis of injection current through thin gate oxide during metal etch

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1997, Pages 45-48

  Kinoshita, Takashi ^a   Krishnan, Srikanth ^a   Dostalik, Willam W ^a   McVittie, James P ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; BOUNDARY CONDITIONS; CHARGE CARRIERS; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CURRENT MEASUREMENT; MONTE CARLO METHODS; MOS DEVICES; OXIDES; SURFACE STRUCTURE;

INJECTION CURRENTS; STEADY STATE CHARGING ANALYSIS; THIN GATE OXIDES;

PLASMA ETCHING;

EID: 0030712556     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)