Process and characterization of nitrogenated carbon

IEEE Transactions on Magnetics

Volumn 33, Issue 5 PART 1, 1997, Pages 3145-3147

  Yang, Ming M ^a  

^a WESTERN DIGITAL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; FILM PREPARATION; HARDNESS; MAGNETRON SPUTTERING; NITROGEN; PRESSURE EFFECTS; SPUTTER DEPOSITION; STRESSES; SUBSTRATES; THERMAL EFFECTS;

NITROGENATED CARBON FILMS;

AMORPHOUS FILMS;

EID: 0031222914     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.617872     Document Type: Article

References (10)

1. K. Howard, United States patent #4,778,582, 1988
2. R. L. White, M. F. Doerner, and G. W. Walker, Mechanical properties of carbon films for thin film disks, Mat. Res. Soc. Symp. Proc. , vol. 188, pp. 213-218, 1990.
3. T. Yamashita, United States patent #5,045,165,1991
4. L. Lee, R. Zubeck, D. Hollars, J. K. Lee, M. Smallen and A. Chao,Material Properties and Tribological Performance of Hydrogenated Sputter Carbon Overcoat on Rigid Disk, J. Vac. Sei. Technol, All, pp. 3007-3113, 1993
5. G. L. Chen, United States patent#5,S67,512, 1996
6. T. A. Yeh, C. L. Lin, J. M. Sivertsen, and J. Judy, Durability and structure of RF sputtered carbon-nitrogen thin film overcoats on rigid disks of magnetic thin film media, IEEE Trans. Magn. , vol. 27, pp. 5163-5165 1991.
7. C. J. Torng, J. M. Silvertsen, J. H. Judy and C. Chang, Structure and bonding studies of C:N thin films produced by tf sputtering method, J. Mat. Res. , V5, Nl 1, pp. . 2490, 1993
8. G. G. Stoney, Proc. R. Soc. London A 82, pp. 172, 1909
9. J. A. Thornton, J. Tabock, and D. W. Huffman, Thin Solid Films 64, pp. 111, 1979
10. S. Agarwal, E. Li, and N. Heiman,Structure and tribological performance of carbon overlayer films, IEEE Trans. Magn. , vol. 29, pp. 264-269, 1993