Structure and Bonding Studies of the C: N Thin Films Produced by rf Sputtering Method

Journal of Materials Research

Volumn 5, Issue 11, 1990, Pages 2490-2496

  Torng, C J ^a   Sivertsen, J M ^a   Judy, J H ^a   Chang, C ^b  

^a UNIVERSITY OF MINNESOTA   (United States)

^b Information Magnetic Corporation ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICROSCOPIC EXAMINATION - TRANSMISSION ELECTRON MICROSCOPY; NITROGEN; PLASMAS - APPLICATIONS; SPECTROSCOPY, AUGER ELECTRON - APPLICATIONS; SPUTTERING - APPLICATIONS;

ARGON/NITROGEN PLASMA; CARBON-NITROGEN THIN FILMS; DIAMOND-LIKE THIN FILMS; RF DIODE SPUTTERING METHOD; X-RAY PHOTOELECTRON SPECTROSCOPY;

CARBON;

EID: 0025521019     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/JMR.1990.2490     Document Type: Article

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