The effect of ion energy on the diamond-like/graphitic ( sp3 sp2) nature of carbon films deposited by ion beams

Diamond and Related Materials

Volumn 3, Issue 4-6, 1994, Pages 542-546

  Lifshitz, Y ^a   Lempert, G D ^a   Rotter, S ^a   Avigal, I ^b   Uzan Saguy, C ^b   Kalish, R ^b   Kulik, J ^c   Marton, D ^c   Rabalais, J W ^c  

^a SOREQ NUCLEAR RESEARCH CENTER   (Israel)

^b TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^c UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRON ENERGY LEVELS; FILM GROWTH; ION BEAMS; PHASE TRANSITIONS; SILICON; SUBSTRATES;

DIAMOND LIKE CARBON FILMS; ION ENERGY;

CARBON;

EID: 0028413474     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/0925-9635(94)90220-8     Document Type: Article

References (30)

1. Ion beam deposition in materials research
2. Film deposition from low energy ion beams
3. 3) Film Growth from Mass Selected Ion Beams: Parametric Investigations and Subplantation Model
4. Are excitons really bosons?
5. Preparation and Properties of High Density, Hydrogen Free Hard Carbon Films with Direct Ion Beam or Arc Discharge Deposition