Electron heating and control of RF-produced plasma parameters excited by a planar, spiral antenna

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4558-4562

  Takechi, Seiji ^a   Shinohara, Shunjiro ^a   Kawai, Yoshinobu ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Antenna plasma resistance; Evanescent wave; ICP; Magnetic field; RF plasma; Skin depth; Spiral antenna; Uniformity

Indexed keywords

ELECTRONS; MAGNETIC FIELD EFFECTS; PLASMA COLLISION PROCESSES; PLASMA DENSITY; PLASMA HEATING;

ANTENNA PLASMA RESISTANCE; ELECTRON HEATING; EVANESCENT WAVES; INDUCTIVELY COUPLED PLASMAS (ICP); SKIN DEPTH MEASUREMENTS; SPIRAL ANTENNAS;

PLASMA WAVES;

EID: 0031176091     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.4558     Document Type: Article

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